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Photocatalytic antimicrobial activity of thin surface films of TiO2, CuO and TiO2 /CuO dual layers on Escherichia coli and bacteriophage T4

机译:TiO2,CuO和TiO2 / CuO双层薄膜对大肠杆菌和T4噬菌体的光催化抗菌活性

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摘要

TiO2 coated surfaces are increasingly studied for their ability to inactivate microorganisms. The activity of glass coated with thin films of TiO2, CuO and hybrid CuO/TiO2 prepared by atmospheric Chemical Vapour Deposition (Ap-CVD) and TiO2 prepared by a sol-gel process was investigated using the inactivation of bacteriophage T4 as a model for\udinactivation of viruses. The chemical oxidising activity was also determined by measuring stearic acid oxidation. The results showed that the rate of inactivation of bacteriophage T4 increased with increasing chemical oxidising activity with the maximum rate obtained on\udhighly active sol-gel preparations. However these were delicate and easily damaged unlike the Ap-CVD coatings. Inactivation rates were highest on CuO and CuO/TiO2 which had the lowest chemical oxidising activities. The inactivation of T4 was higher than that of Escherichia coli on low activity surfaces. The combination of photocatalysis and toxicity of copper acted synergistically to inactivate bacteriophage T4 and retained some selfcleaning activity. The presence of phosphate ions slowed inactivation but NaCl had no effect. The results show that TiO2/CuO coated surfaces are highly antiviral and may have applications in the food and healthcare industries.
机译:越来越多地研究了TiO2涂层表面灭活微生物的能力。以噬菌体T4的灭活为模型,研究了常压化学气相沉积(Ap-CVD)制得的TiO2,CuO和杂化CuO / TiO2和溶胶-凝胶法制得的TiO2薄膜的玻璃的活性。病毒的灭活。化学氧化活性也通过测量硬脂酸氧化来确定。结果表明,随着化学氧化活性的提高,噬菌体T4的失活速率增加,而在高活性溶胶-凝胶制剂中获得的最大速率。但是,它们与Ap-CVD涂层不同,非常脆弱且容易损坏。 CuO和CuO / TiO2的失活率最高,化学氧化活性最低。在低活性表面上,T4的失活高于大肠杆菌。光催化和铜的毒性相结合协同作用使噬菌体T4失活,并保留了一些自清洁活性。磷酸根离子的存在减缓了失活,但NaCl没有作用。结果表明,TiO2 / CuO涂层表面具有很高的抗病毒性,并可能在食品和医疗保健行业中得到应用。

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